The basic Dual Ion Beam Sputtering (DIBS) chamber set up as comprises an etching source that precisely directs a neutralised ion beam onto a wafer located in the substrate holder. Normally, for good ...

BARRINGTON, N.J. and PLAINVIEW, N.Y., June 28, 2018 (GLOBE NEWSWIRE) -- Edmund Optics ®, the world’s leading supplier of optical components, has ordered the SPECTOR ® Ion Beam Sputtering ...

Efforts to improve the quality and performance of deposited fluorides films includes the use of ion beam sputtering. While the energy of ion beam sputtering removes some of the fluorine atoms during ...

It is now widely accepted to use large argon clusters for sputter depth ... undisturbed. An ion channeling bend in the focusing column then removes energetic neutrals. The beam is then focused ...

Denton’s bias target ion beam sputtering technology is unique, providing collimated, ultra-uniform films for fill and planarization. In addition to the better breakdown voltage of IBD films is ...

The data suggested that the surface atoms' binding energies were increased. Since the ion beam sputter rate scaled inversely with binding energy, it implied a significant decrease. Therefore, the ...

Veeco Instruments has announced that it has shipped its Spector Ion Beam Sputtering (IBS) system and Sirius Optical Monitor System to the Fraunhofer Institute for Telecommunications (HHI). The ...

Compared to conventional sputter deposition technologies like ... The superior on-wafer performance is achieved by using unique ion beam deposition hardware and process parameters to control ...